The MA-500 mask aligner for producing ultrahigh-resolution features in substrates, such as planar or fiberoptic waveguides, uses an excimer laser emitting at 248 or 193 nm. The system includes beam-shaping and focusing optics, a beam attenuator, mask and fiber-holding and alignment mechanics, a CCD-based fiber viewing system, and optional integrated dose control and beam profiling.


Menlo Park, CA

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