Etec, Inc. and Umech Technologies announce joint product agreement
Aug. 7, 2001--Etec, Inc. and Umech Technologies, LLC. announced a joint product agreement to develop next generation MEMS test systems.
Etec, Inc. and Umech Technologies, LLC. announced a joint product agreement to develop next generation MEMS test systems. The new product line will incorporate an enhanced version of Etec's MEMS Motion Analyzer (MMA), engineered by Umech. It will also utilize Etec's M/STeP integrated hardware/software test environment. An integrated semi-automatic wafer probe station gives the system the ability to measure wafer-level MEMS devices. The line is targeted at pilot and low volume production applications, as well as analytical applications requiring the testing of unpackaged (wafer-level) devices.
As part of the agreement, Etec has been granted exclusive worldwide distribution of Umech's embedded version of the MMA (known as EMMA) product line for measuring dynamic micro-motions of MEMS/MOEMS structures. This innovative system combines video microscopy, stroboscopic illumination and proprietary algorithms to visualize and analyze the motions of entire microstructures and arrays of microstructures. The system can simultaneously acquire data in three dimensions and six degrees of freedom with sub-nanometer resolution.
Established in 1986 as an electronics testing business, Etec has been providing instrumentation and equipment for volume production of MEMS devices for the past six years. Etec's unique scalable system architecture supports MEMS testing from development through production. For more information, visit www.etec-inc.com.