Photronics, Inc. (Nasdaq: PLAB), a sub-wavelength reticle solutions supplier, announced it has become one of the founding members of the Advanced Reticle Center (ARC), a European research consortium. The ARC, which is located in Stuttgart, Germany, has been formed by a number of companies and institutes with the common goal of accelerating the development of advanced reticle manufacturing technologies. The membership is comprised of Photronics and leading-edge equipment and material suppliers, as well as software developers and research institutes. The consortium is partnering to facilitate an advanced research pilot line for reticles by providing their expertise, advanced tools, materials and services. Financial details of the partnership were not disclosed.
In addition to Photronics, ARC members include ASM Lithography, ARCH Chemicals, Heidelberg Instruments, IMEC, IMS-CHIPS, Leica Microsystems, M+W Zander, PDF Solutions GmbH aiss division, Schott ML GmbH, Steag Hamatech AG and Unaxis USA, Inc. Each member is represented on the organization's Advisory Board, which is responsible for achieving the strategic objectives of the ARC.
As its first project, the members of the ARC will focus their expertise on reticle performance dynamics and the essential requirements at the reticle plane to fabricate integrated circuit designs for the 70 nanometer (or 0.07 micron) technology node. All intellectual property developed as a result of the ARC's research will be restricted for the use of designated ARC members.
Additional information will be available at the company's exhibit at Semicon Europa in Munich, Germany from April 24 to 26 at Stand number B 1-328.
About Photronics:
Photronics is a manufacturer of photomasks. For more information, visit www.photronics.com.