Opto Speed increases production of InP-based lasers and detectors

Jan. 8, 2001

Opto Speed increases its production capacity for InP-based lasers, detectors and several other optoelectronic devices by adding an AIX 2400G3 Planetary Reactor to its existing AIXTRON MOCVD tool.

Opto Speed, a group with subsidiaries in Switzerland, Germany and Italy has decided to increase its production capacity for InP-based lasers, detectors and several other optoelectronic devices by adding an AIX 2400G3 Planetary Reactor to its existing AIXTRON MOCVD tool.

Opto Speed will use the new reactor for the growth of advanced epitaxial layers applied in 10Gb/s product families. Opto Speed's experience in the field of InP/GaInAsP MOCVD for telecommunication applications enforced the decision for the AIX 2400G3 production platform as a straightforward route to further strengthen the company's position in the optical communication market.

The AIX 2400/2600G3 has a flexible design for up to 35x2 inch and 5x6 inch wafers. The two-flow horizontal Planetary Reactor is a widely used multiwafer MOCVD reactor for compound semiconductor applications. The reactor concept allows laminar gas flow without turbulences for precise control of the material composition and achievement of ultra-sharp interfaces. Ultra-high uniformity and high-growth efficiency on multiple 2, 3, 4 or 6-inch wafers is achieved through wafer rotation with the patented Gas Foil Rotation.