Optical Switch Corp. (OSC), announced today the installation and final acceptance of its Model PC2 high-resolution lithography system by JDS Uniphase, Eindhoven, The Netherlands. The interference lithography-based Model PC2, developed by OSC's Microphotonics Group in Bedford, MA, generates 190-nm to 260-nm period grating structures with a fully automated, high-throughput patterning tool and process.
OSC's patented interference lithography systems fully automate the calibration and reconfiguration of lithography applications, making the OSC systems more cost efficient and operationally precise than conventional lithography equipment, claims the company. In addition, the OSC systems reduce processing times from hours to minutes.
All OSC systems utilize a patented fiber beam delivery system and are equipped with fully automated pitch selection, automated beam centering, beam balance, and dose calibration, along with complete system optimization through the click of a mouse, say OSC representatives.
For more information about Optical Switch Corp., headquartered in Richardson, TX, visit the company's Web site at www.opticalswitch.com.