Grating fabrication for DWDM
The HLS Model PC2 is designed for bringing bench-top laboratory techniques into a high-throughput manufacturing production environment. It uses holographic, or interference, lithography to provide the means to generate gratings in indium phosphide-based materials with a pitch range from 193 to 260 nm over a 60-mm diameter area. The system employs an argon ion laser operating at 457.9 nm. It incorporates dial-in pitch selectivity, allowing rapid pattern selection and changes, according to the manufacturer. Pattern pitch is selected by a simple software selection and is calibrated to a resolution of 0.2 nm.
Holographic Lithography Systems Inc.
Bedford, MA
